Germanium Photodiode Dark Current at Wanda Devine blog

Germanium Photodiode Dark Current. Our germanium photodiode shows a bandwidth in excess of 260 ghz at a photocurrent of 1 ma. We present a novel waveguide coupling scheme where a germanium diode grown via rapid melt growth is wrapped around a silicon. This device outperforms all other. The dark current generation in such ge on. We propose a simple germanium schottky photodiode, in which an ultrathin al 2 o 3 or hfo 2 interlayer is inserted between the. We present a compact 1.3 × 4 μm2 germanium waveguide photodiode, integrated in a cmos compatible silicon photonics process flow. The dark current is about 18 na under −1 v bias and increases up to 610 μa under −7 v.

Photodiode characteristics a, Currentvoltage characteristic curve
from www.researchgate.net

The dark current is about 18 na under −1 v bias and increases up to 610 μa under −7 v. This device outperforms all other. Our germanium photodiode shows a bandwidth in excess of 260 ghz at a photocurrent of 1 ma. We propose a simple germanium schottky photodiode, in which an ultrathin al 2 o 3 or hfo 2 interlayer is inserted between the. The dark current generation in such ge on. We present a novel waveguide coupling scheme where a germanium diode grown via rapid melt growth is wrapped around a silicon. We present a compact 1.3 × 4 μm2 germanium waveguide photodiode, integrated in a cmos compatible silicon photonics process flow.

Photodiode characteristics a, Currentvoltage characteristic curve

Germanium Photodiode Dark Current The dark current generation in such ge on. Our germanium photodiode shows a bandwidth in excess of 260 ghz at a photocurrent of 1 ma. We present a novel waveguide coupling scheme where a germanium diode grown via rapid melt growth is wrapped around a silicon. The dark current is about 18 na under −1 v bias and increases up to 610 μa under −7 v. The dark current generation in such ge on. We propose a simple germanium schottky photodiode, in which an ultrathin al 2 o 3 or hfo 2 interlayer is inserted between the. This device outperforms all other. We present a compact 1.3 × 4 μm2 germanium waveguide photodiode, integrated in a cmos compatible silicon photonics process flow.

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